专利名称：Coating apparatus and coating method发明人：五十川 良則申请号：JP2018170186申请日：20180912公开号：JP2020043244A公开日：20200319
专利附图：
摘要：In the technique for forming a crystallized film by applying a solution, acrystalline film having a high crystal orientation is stably formed. Solution: the coatingapparatus comprises a processing chamber 1, a nozzle 31 for applying a solution of acrystallizing material to the coating target surface while moving relative to a coating
target surface (e.g., the surface of the substrate TM) in the processing chamber 1, and aninternal pressure adjusting part 4 for adjusting the internal pressure of the processingchamber 1, and a control part .When the solution is applied to the nozzle 31, the controlsection 5 adjusts the internal pressure of the processing chamber 1 by the internalpressure adjusting section 4, thereby drying the solution applied to the surface to beapplied, thereby growing the crystallized material.Diagram
申请人：タツモ株式会社
地址：岡山県井原市木之子町６１８６番地
国籍：JP
代理人：特許業務法人 楓国際特許事務所
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