Apparatus and method for inspecting samples

专利名称：Apparatus and method for inspecting

samples

发明人：Nishiyama, Hidetoshi,Koizumi, Mitsuru,Suga,

Mitsuo

申请号：EP10250397.6申请日：20100305公开号：EP2312302A1公开日：20110420

专利附图：

摘要：An inspection apparatus and method capable of well observing or inspecting aspecimen (20) contained in a liquid. Maintenance of the apparatus can be improved. The

inspection apparatus has a film (32) including first (32a) and second (32b) surfaces.Furthermore, the apparatus has a vacuum chamber (11) for reducing the pressure in theambient in contact with the second surface (32b) of the film, primary beam irradiationmeans (2) connected with the vacuum chamber (11), and a shutter (4) for partiallypartitioning the space between the film (32) and the primary beam irradiation means (2)within the vacuum chamber (11). A liquid sample (20) is held on the first surface of thefilm. The primary beam irradiation means (2) irradiates the sample with a primary beam (7)through the film (32). Backscattered electrons (a secondary beam) (61) produced fromthe sample by the primary beam irradiation are directed at the shutter (4), producingsecondary electrons (a tertiary signal) (62). The secondary electrons (62) are detected bya detector (16) . The apparatus further includes a vacuum gauge (15) for detecting thepressure inside the vacuum chamber (11).

申请人：Jeol System Technology Co., Ltd.

地址：1-2 Musashino 3-chome Akishima, Tokyo 196-8558 JP

国籍：JP

代理机构：Cross, Rupert Edward Blount

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