专利名称：Measurement of plural RF sensor devices in
a pulsed RF plasma reactor
发明人：Gary Leray申请号：US141509申请日：20140127公开号：US09190247B2公开日：20151117
专利附图：
摘要：In a plasma reactor having pulsed RF plasma power sources, measurements byRF sensors of nulls attributable to pulse duty cycles are replaced by non-zeromeasurements synthesized from prior non-zero measurements, to prevent feedback
control system instabilities.
申请人：APPLIED MATERIALS, INC.
地址：Santa Clara CA US
国籍：US
代理人：Robert M. Wallace
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