专利名称：Developing method and developing
apparatus
发明人：Kazuo Sakamoto,Akira Nishiya申请号：US09589169申请日：20000608公开号：US06382849B1公开日：20020507
专利附图：
摘要：In a developing processing to apply the developing solution onto the substrateafter the light exposure, a developing solution supply nozzle scans a substrate morethan once while discharging the developing solution on the substrate in a band shape to
coat the substrate with the developing solution. Thus, it is possible to perform adeveloping processing with a small variation and high uniformity of the line width.
申请人：TOKYO ELECTRON LIMITED
代理机构：Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
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